- Dual beam systems uses electron beam for imaging and gallium ions for imaging and precise micromachining
- High resolution imaging down to the nanometer level
FLYER
- Dual beam system uses electron beam for imaging and gallium ions for imaging and precise micromachining
- High resolution imaging down to the sub-nanometer level
FLYER
- Dual beam system uses electron beam for imaging and xenon ions for imaging and precise micromachining
- Large volume 3D characterization
FLYER
- Focused ion beam instrument with gas-assisted etching and beam-induced deposition
- Enables IC circuit edit for debugging microchip designs and accessing internal data of security and encryption microcontrollers
FLYERS
- Focus ion beam (FIB) microscope with helium and neon beams
- Imaging resolution down to 5 angstroms and sub-10nm material removal
FLYER
- Scanning electron microscope with integrated gallium ion beam allowing nanometer precision material removal
- Capable of 3D nanotomography, nanofabrication, and precise analytical analysis
FLYER