- Dual beam systems uses electron beam for imaging and gallium ions for imaging and precise micromachining
- High resolution imaging down to the nanometer level
Archives
Helios 460F1 Dual Beam
- Dual beam system uses electron beam for imaging and gallium ions for imaging and precise micromachining
- High resolution imaging down to the sub-nanometer level
Helios PFIB Dual Beam
- Dual beam system uses electron beam for imaging and xenon ions for imaging and precise micromachining
- Large volume 3D characterization
Aspex Explorer VP SEM
- Easy operation in high and low vacuum mode facilitates imaging of any material
- Auto-mode particle counting, measuring, and chemical identification requires no user input once initiated
Teneo LV SEM
- Unique detection system provides high contrast for a wide range of samples
- Low vacuum mode allows analysis of insulating samples with no conductive coating
Verios 460L SEM
- High resolution imaging to the nanoscale with multiple detectors for topographic and compositional material information
- High flexibility in loading samples gives additional options for analyses
Tecnai T-12 TEM
- Nanometer level imaging and elemental analysis
- Variable accelerating voltage can be customized to suit sample sensitivity
Talos 200 S/TEM
- Atomic resolution imaging and elemental analysis
- Customized fittings available to perform in situ dynamic experiments in real time
Titan Themis ACEM
- Single atom resolution imaging and elemental analysis
- Spherical aberration corrected for the highest spatial resolution